高级检索

222纳米紫外线消毒技术研究进展

Research progress in 222-nm ultraviolet C light for disinfection: a review

  • 摘要: 近年来222纳米紫外线(222-nm UVC)作为一种新兴的消毒技术,因其高效、广谱的杀菌特性和潜在的低生物危害性而受到广泛关注。本文系统综述了222-nm UVC的光化学作用机制及其杀菌效果,并综合评估该技术的生物安全性,重点关注其对皮肤屏障功能与眼表组织的潜在风险。同时还探讨222-nm UVC在应用过程中伴随的臭氧的生成风险,并评述相关的消毒策略及新型消毒设备的研究进展。旨在为该技术的精准化应用提供理论依据;兼顾抗菌效能与人体安全,推动其在院内感染控制及公共卫生危机应对中的转化应用。

     

    Abstract: As an emerging disinfection technology, 222-nm ultraviolet C light (222-nm UVC) has attracted considerable research interest due to its potent broad-spectrum antimicrobial properties and potentially favorable biosafety profile. This review provides a systematic examination of the photochemical mechanisms mediating the germicidal effects of 222-nm UVC and comprehensively evaluates the biosafety of this technology, with a particular emphasis on potential impacts on cutaneous barrier integrity and ocular surface tissue. Furthermore, we discuss the risk of ozone generation during 222-nm UVC application and critically analyze recent advances in disinfection protocols and device development. By synthesizing current evidence, this review aims to establish a scientific foundation for the precise clinical implementation of this technology and optimize the balance between antimicrobial efficacy and human safety to facilitate the translational applications of this technology in healthcare-associated infection control and public health emergency management.

     

/

返回文章
返回